Science Daily (April 27) -- Researchers from the University of Illinois at Urbana-Champaign have developed a one-step, facile method to pattern graphene by using stencil mask and oxygen plasma reactive-ion etching, and subsequent polymer-free direct transfer to flexible substrates. This new approach sets forth transformative changes in "do It yourself" graphene-based device development for broad applications including flexible circuits/devices and wearable electronics. Also: Solid State Technology (April 28).