Dren Qerimi

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Education

• BS: Nuclear, Plasma, and Radiological Engineering, University of Illinois, Urbana, IL - May 2016
• MS: Nuclear, Plasma, and Radiological Engineering, University of Illinois, Urbana, IL - May 2019
• PhD: Nuclear, Plasma, and Radiological Engineering, University of Illinois, Urbana, IL - Nov 2021

Academic Positions

• Associate Director  March 2024 - Present
• Research Assistant Professor March 2024 - Present

Research Statement

My research trajectory in Nuclear, Plasma, and Radiological Engineering is driven by a forward-thinking approach to advancing technology and fostering collaboration between academia and industry. As a research professor, I am particularly drawn to the mission of the Illinois Plasma Institute (IPI), an initiative of the Grainger College of Engineering at the University of Illinois Urbana-Champaign. The founding principles of the IPI resonate deeply with my own goals, as it seeks to reimagine traditional pathways to technology commercialization by creating a collaborative environment where academic researchers and industrial partners can work together closely. This collaborative model allows for a transition from laboratory research to production-level implementation, ultimately shortening the time to adoption in high-volume manufacturing. My experience within the semiconductor industry has reinforced the importance of such collaborative initiatives. Working on research and development projects related to memory deposition tools and artificial intelligence, I've witnessed firsthand the benefits of interdisciplinary collaboration and knowledge sharing between academia and industry.

Research Interests

• EUV Photo-Resist Development
• Extreme Ultra Violet (EUV) Sources
• 3-D Graphene Production Research
• Plasma Sources: DBD, PVD, PECVD, ICP, CCP, Microwave Source
• Semiconductor Processing, Deposition, Etching

Selected Articles in Journals

• Determination of recombination coefficients for hydrogen, oxygen, and nitrogen gasses via in situ radical probe system  
• Single Electrode A.C. Plasma Anemometer in High Speed H2 Jet With Background RF Plasma
• Study of Sn removal by surface wave plasma for source cleaning
• Radical probe system for in situ measurements of radical densities of hydrogen, oxygen, and nitrogen
• Tin removal by an annular surface wave plasma antenna in an extreme ultraviolet lithography source 
• Study of a linear surface wave plasma source for tin removal in an extreme ultraviolet source

Articles in Conference Proceedings

• Modeling Sn scattering through hydrogen using DFT potentials
• Study of Sn removal by surface wave plasma for source cleaning
• Influence of temperature, hydrogen ions, and hydrogen radicals on Sn etching"

Honors

• Engineering Vision Award
• Nguyen Thi Coung Fellowship